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APPLICATIONS OF TECHNOLOGY: Semiconductor device manufacturing Sensors ADVANTAGES: Scalable manufacturing process Single pass simplicity Suitable for precision patterning ABSTRACT: Yuegang Zhang and a team of Berkeley Lab scientists have developed a single-step chemical vapor deposition (CVD) process that can bond a single layer of graphene onto a … [Read more...] about Single Pass Graphene Deposition on Dielectric Surfaces   JIB-2758

E.O. Lawrence Berkeley National Laboratory APPLICATIONS OF TECHNOLOGY: Use with a variety of filtered cathodic arc systems Deposition of dense, defect-free, continuous films ADVANTAGES: High plasma throughput Pre-cleaned of macroparticles ABSTRACT: André Anders, Robert MacGill and Marcela Bilek of Berkeley Lab have designed a miniaturized source … [Read more...] about Cathodic Arc Plasma System with Twist Filter: Miniaturized Cathodic Arc Plasma Source IB-1497

SUMMARY OF THE INVENTION The invention is an extractor system for a plasma ion source comprising a single (first) electrode or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures, to which suitable voltage(s) are applied, wherein the aperture(s) in the first electrode (and/or second … [Read more...] about Ion Beam Extractor with Counterbore IB-1780

APPLICATIONS OF TECHNOLOGY: Maskless lithography X-ray production ADVANTAGES: Minimizes lithographic exposure times Facilitates remote scanning ABSTRACT: This technology provides techniques for patterned beamlet extraction. The beamlets can be either positive ions or electrons, and they may be produced with a diameter of one micrometer with … [Read more...] about Source for High Brightness Multiple Beamlets IB-2197