APPLICATIONS OF TECHNOLOGY: X-ray research at synchrotron beamlines or laboratory-scale systems Medical X-ray beams Laser systems Particle or liquid streams Beamline diagnostics ADVANTAGES: Fast, high precision controls Fast open-to-close time No mechanical moving parts Modular design enables … [Read more...] about Modular, High Precision Collimator IB-2883
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Pulsed Heating to Extend Ion Source Lifetime and Gate Ion Current IB-2994
APPLICATIONS OF TECHNOLOGY: Ion source for accelerators in chemical, medical, semiconductor and nuclear industries Modification of alkali ion battery electrodes Ion beam lithography Nuclear instrument calibration Mass spectrometry equipment Heavy ion fusion drivers Ion thruster for space propulsion Surface and material sciences … [Read more...] about Pulsed Heating to Extend Ion Source Lifetime and Gate Ion Current IB-2994
Lithographic Dry Development Using Optical Absorption IB-2816
APPLICATION OF TECHNOLOGY: Lithographic development of photo resist materials ABSTRACT: A novel approach to dry development of exposed photo resist is described in which a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure. The class of compounds used as the resist material, under the influence of the light … [Read more...] about Lithographic Dry Development Using Optical Absorption IB-2816
Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179
APPLICATIONS OF TECHNOLOGY: Fabricates Stencils serving as masks for photolithography Nanoscale micro-electronics mechanical systems (MEMS) Patterned surfaces for applications in materials science and biology ADVANTAGES: Generates holes having diameters less than 200 nm and clean walls Permits analysis of nanometer-sized portions of … [Read more...] about Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179
Extreme Ultraviolet Lithography Tools IB-2468, IB-2469, IB-2476, IB-2477, IB-2478, IB-2479
APPLICATIONS OF TECHNOLOGY: Extreme ultraviolet (EUV) lithography Semiconductor manufacturing Nanopatterning Directed self assembly ADVANTAGES: Low cost High resolution Capable of working with incoherent light sources Does not require excessive spatial or temporal filtering Large depth of focus (depending on source properties) High speed … [Read more...] about Extreme Ultraviolet Lithography Tools IB-2468, IB-2469, IB-2476, IB-2477, IB-2478, IB-2479