08.09.14 PolyPlus, a startup based on technologies developed at Berkeley Lab, continues to make progress on rechargeable lithium-sulfur and lithium-air battery solutions despite resisting funding offers from venture capital sources. The 27-employee company, awarded $4.5M from ARPA-E in 2013, has outlasted notable competitors and forged relationships with key industry players … [Read more...] about PolyPlus Advances Battery Tech, Says “No” to VC Funding
Lithographic Dry Development Using Optical Absorption IB-2816
APPLICATION OF TECHNOLOGY: Lithographic development of photo resist materials ABSTRACT: A novel approach to dry development of exposed photo resist is described in which a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure. The class of compounds used as the resist material, under the influence of the light … [Read more...] about Lithographic Dry Development Using Optical Absorption IB-2816
Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179
APPLICATIONS OF TECHNOLOGY: Fabricates Stencils serving as masks for photolithography Nanoscale micro-electronics mechanical systems (MEMS) Patterned surfaces for applications in materials science and biology ADVANTAGES: Generates holes having diameters less than 200 nm and clean walls Permits analysis of nanometer-sized portions of … [Read more...] about Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179
Extreme Ultraviolet Lithography Tools IB-2468, IB-2469, IB-2476, IB-2477, IB-2478, IB-2479
APPLICATIONS OF TECHNOLOGY: Extreme ultraviolet (EUV) lithography Semiconductor manufacturing Nanopatterning Directed self assembly ADVANTAGES: Low cost High resolution Capable of working with incoherent light sources Does not require excessive spatial or temporal filtering Large depth of focus (depending on source properties) High speed … [Read more...] about Extreme Ultraviolet Lithography Tools IB-2468, IB-2469, IB-2476, IB-2477, IB-2478, IB-2479
Graphene Membranes for Nanometer-scale Lithography and Single Atom Resolution TEM Imaging , 2502 IB-2501
APPLICATIONS OF TECHNOLOGY: Using electron-beam induced deposition (EBID) on graphene membranes to create nano-scale doping patterns for electronic circuits lithography etch masks diffraction gratings (for monochromators, spectrometers, wavelength division multiplexing devices, optical pulse compressing devices and other optical devices) Investigating the … [Read more...] about Graphene Membranes for Nanometer-scale Lithography and Single Atom Resolution TEM Imaging , 2502 IB-2501