APPLICATIONS OF TECHNOLOGY: Method to explore and test material properties under ultrafast external fields Light-driven novel device applications that combine photonic and electronic processes (e.g., photo-transistors and spin-transistors) BENEFITS: Minimizes lithography Enables complex operations across an integrated wafer without intricate arrangements of … [Read more...] about Light-driven Ultrafast Electric Gating 2021-079
Electronics
Improved Mask Absorber for Extreme Ultraviolet Lithography 2019-058
APPLICATIONS OF TECHNOLOGY: Extreme ultraviolet (EUV) masks for EUV-made semiconductors BENEFITS: The alloy used can be controllably patterned by plasma processing via a newly discovered self-passivation mechanism of chromium Materials are easily etchable Process has very high material selectivity BACKGROUND: The fabrication of the mask absorber is a … [Read more...] about Improved Mask Absorber for Extreme Ultraviolet Lithography 2019-058
First Diode for Thermal Management of Micro and Macro Devices IB-2336
APPLICATIONS OF TECHNOLOGY: Thermal management for: microelectronic devices solar cells and solar energy management systems refrigerators hybrid biological/inorganic systems nanoscale calorimeters Information transport and processing Molecular motors ADVANTAGES: First solid state device to direct heat flow Initial tests demonstrate … [Read more...] about First Diode for Thermal Management of Micro and Macro Devices IB-2336