APPLICATIONS OF TECHNOLOGY: Extreme ultraviolet (EUV) lithography Semiconductor manufacturing Nanopatterning Directed self assembly ADVANTAGES: Low cost High resolution Capable of working with incoherent light sources Does not require excessive spatial or temporal filtering Large depth of focus (depending on source properties) High speed … [Read more...] about Extreme Ultraviolet Lithography Tools IB-2468, IB-2469, IB-2476, IB-2477, IB-2478, IB-2479
Semiconductor and Other Manufacturing
Graphene Membranes for Nanometer-scale Lithography and Single Atom Resolution TEM Imaging , 2502 IB-2501
APPLICATIONS OF TECHNOLOGY: Using electron-beam induced deposition (EBID) on graphene membranes to create nano-scale doping patterns for electronic circuits lithography etch masks diffraction gratings (for monochromators, spectrometers, wavelength division multiplexing devices, optical pulse compressing devices and other optical devices) Investigating the … [Read more...] about Graphene Membranes for Nanometer-scale Lithography and Single Atom Resolution TEM Imaging , 2502 IB-2501
Single Pass Graphene Deposition on Dielectric Surfaces JIB-2758
APPLICATIONS OF TECHNOLOGY: Semiconductor device manufacturing Sensors ADVANTAGES: Scalable manufacturing process Single pass simplicity Suitable for precision patterning ABSTRACT: Yuegang Zhang and a team of Berkeley Lab scientists have developed a single-step chemical vapor deposition (CVD) process that can bond a single layer of graphene onto a … [Read more...] about Single Pass Graphene Deposition on Dielectric Surfaces JIB-2758
Cathodic Arc Plasma System with Twist Filter: Miniaturized Cathodic Arc Plasma Source IB-1497
E.O. Lawrence Berkeley National Laboratory APPLICATIONS OF TECHNOLOGY: Use with a variety of filtered cathodic arc systems Deposition of dense, defect-free, continuous films ADVANTAGES: High plasma throughput Pre-cleaned of macroparticles ABSTRACT: André Anders, Robert MacGill and Marcela Bilek of Berkeley Lab have designed a miniaturized source … [Read more...] about Cathodic Arc Plasma System with Twist Filter: Miniaturized Cathodic Arc Plasma Source IB-1497
Ion Beam Extractor with Counterbore IB-1780
SUMMARY OF THE INVENTION The invention is an extractor system for a plasma ion source comprising a single (first) electrode or a pair of spaced electrodes, a first or plasma forming electrode and a second or extraction electrode, with one or more aligned apertures, to which suitable voltage(s) are applied, wherein the aperture(s) in the first electrode (and/or second … [Read more...] about Ion Beam Extractor with Counterbore IB-1780