E.O. Lawrence Berkeley National Laboratory APPLICATIONS OF TECHNOLOGY: Use with a variety of filtered cathodic arc systems Deposition of dense, defect-free, continuous films ADVANTAGES: High plasma throughput Pre-cleaned of macroparticles ABSTRACT: André Anders, Robert MacGill and Marcela Bilek of Berkeley Lab have designed a miniaturized source … [Read more...] about Cathodic Arc Plasma System with Twist Filter: Miniaturized Cathodic Arc Plasma Source IB-1497
Semiconductor and Other Manufacturing
Cathodic Arc Plasma System with Twist Filter – Triggerless Method of Cathodic Arc Initiation IB-1489
Ernest Orlando Lawrence Berkeley National Laboratory APPLICATIONS OF TECHNOLOGY: Vacuum arc ion sources Mevva ion sources ADVANTAGES: Simple method Can be used with large number of cathode materials Cathodic arc can be initiated without the need for a high-voltage trigger pulse ABSTRACT André Anders has developed a simple method by which a … [Read more...] about Cathodic Arc Plasma System with Twist Filter – Triggerless Method of Cathodic Arc Initiation IB-1489
Cathodic Arc Plasma System with Twist Filter: Advanced Macroparticle Twist Filter, Magnetic Expander and Homogenizer for Cathodic Arc Plasmas IB-1484
E.O. Lawrence Berkeley National Laboratory APPLICATIONS OF TECHNOLOGY: Use with a variety of filtered cathodic arc systems Deposition of dense, defect-free, continuous films ADVANTAGES: Minimize plasma losses Maximize plasma throughput Maximize transport efficiency Greatly reduced likelihood of particle transmission Particles virtually eliminated … [Read more...] about Cathodic Arc Plasma System with Twist Filter: Advanced Macroparticle Twist Filter, Magnetic Expander and Homogenizer for Cathodic Arc Plasmas IB-1484
Universal Pattern Generator for Micro-Ion Beam Reduction Lithography IB-1387
APPLICATION OF TECHNOLOGY: Lithography, ion implantation/doping, magnetic storage ADVANTAGES: Can generate multiple patterns with a single mask Produces feature sizes of 50 nm or less Beam reduction potential up to a factor of 50x Eliminates the first stage of the conventional IPL system Offers potentially higher throughputs No stencil mask: … [Read more...] about Universal Pattern Generator for Micro-Ion Beam Reduction Lithography IB-1387
High Current Focused Ion Beam System IB-1217
APPLICATION OF TECHNOLOGY: Lithography Semiconductor doping/ion implantation High resolution scanning ion microscopy Failure analysis and design modification for integrated circuit fabrication Repair of optical and x-ray lithography masks Micromachining ADVANTAGES: Ion beam current on the order of microamps for high throughput Feature sizes potentially as … [Read more...] about High Current Focused Ion Beam System IB-1217