APPLICATIONS OF TECHNOLOGY: Fabrication of low resistivity non-alloyed ohmic contacts on n-type gallium arsenide devices. ADVANTAGES: Low resistivity Minimize heat generation Reduce power consumption Simple fabrication process Reproducible process ABSTRACT: Wladyslaw Walukiewicz and Kin Man Yu at Berkeley Lab have developed a technique that would … [Read more...] about Co-implantation of Group VI Elements and Nitrogen for the Formation of Non-Alloyed Ohmic Contacts for n-type GaAs IB-1609
Semiconductor and Other Manufacturing
Cost-Effective Identification of Novel, Semiconductor Detector Materials IB-2199
APPLICATIONS OF TECHNOLOGY: Identifying new semiconductor detector materials used to fabricate Nuclear detectors for X-ray and gamma-ray spectrometers Portable detectors for identifying radioactive isotopes The advancement of physics, homeland security, and nuclear non-proliferation ADVANTAGES: Provides more accurate screening of materials than … [Read more...] about Cost-Effective Identification of Novel, Semiconductor Detector Materials IB-2199
Stable and Highly Conductive Transparent Semiconductors IB-2957
APPLICATIONS OF TECHNOLOGY: Transparent thin film transistors (TFTs) Photovoltaics Resistive oxide memory Photocatalysis and catalysis Chemical sensors ADVANTAGES: Transparent Stable in an electric field High electron mobility ABSTRACT: Scientists at Berkeley Lab have developed a method for inserting halogens into transition metal oxides (TMOs) to … [Read more...] about Stable and Highly Conductive Transparent Semiconductors IB-2957
Lithographic Dry Development Using Optical Absorption IB-2816
APPLICATION OF TECHNOLOGY: Lithographic development of photo resist materials ABSTRACT: A novel approach to dry development of exposed photo resist is described in which a photo resist layer is exposed to a visible light source in order to remove the resist in the areas of exposure. The class of compounds used as the resist material, under the influence of the light … [Read more...] about Lithographic Dry Development Using Optical Absorption IB-2816
Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179
APPLICATIONS OF TECHNOLOGY: Fabricates Stencils serving as masks for photolithography Nanoscale micro-electronics mechanical systems (MEMS) Patterned surfaces for applications in materials science and biology ADVANTAGES: Generates holes having diameters less than 200 nm and clean walls Permits analysis of nanometer-sized portions of … [Read more...] about Nanometer-Scale Ablation Using Focused, Coherent Extreme Ultraviolet / Soft X-ray Light JIB-3179